Electrical Engineering and Computer Science

Nanoelectronic Materials and Devices Laboratory (NanoLabUT)

Welcome to the Nanoelectronic Materials and Devices Laboratory (NanoLabUT) located in the North Engineering building at the University of Toledo, Toledo, Ohio. Our expertise lies in the areas of electrical and optical characterization of nanoelectronic devices, and fabrication of advanced electronic, optoelectronic, photovoltaic, and sensing devices incorporating nanodot, nanofiber, nanotube, and thin films. We are fully equipped to perform a wide range of electrical and optical characterization in the temperature range of 4.2K to 475K in dark and illuminated conditions. Our electrical characterization capability includes:

  • Admittance spectroscopy
  • Optical admittance spectroscopy
  • Minority carrier lifetime measurement
  • Surface potential and work function measurement
  • Surface states and defects characterization
  • Current-voltage and conductance measurement
  • Carrier generation and transport characterization
  • Reliability characterization
  • Electroluminance measurement
  • Photovoltaic and photoconductivity measurement

We are also capable of performing advanced process, device, and circuit simulations to design novel nanoelectronic solid state devices and optimize various device, materials, and process parameters to achieve the desired performance.


Electrical Characterization Facility

Characterization Equipment

The 4200 SCS Semiconductor Characterization System is configured with 4 SMU and one pre-amplifier enabling current measurement in the range of a fraction of fA to hundred mA. The 4200 SCS is integrated with Capacitance-Voltage (CV) unit capable of measuring capacitance and conductance at different measurement frequencies. This configuration along with preloaded software enable the measurement of various device parameters including electrical and optical parameters, photovoltaic characteristics, carrier transport, carrier lifetime, reliability, defects, surface states, and conductivity.


  • Keithley 4200 SCS Semiconductor Characterization System

The 4200 SCS Semiconductor Characterization System is configured with 4 SMU and one pre-amplifier enabling current measurement in the range of a fraction of fA to hundred mA. The 4200 SCS is integrated with Capacitance-Voltage (CV) unit capable of measuring capacitance and conductance at different measurement frequencies. This configuration along with preloaded software enable the measurement of various device parameters including electrical and optical parameters, photovoltaic characteristics, carrier transport, carrier lifetime, reliability, defects, surface states, and conductivity.

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  • Lakeshore TTPX Cryogenic Probe Station

The TTPX cryogenic probe station is configured to enable probing of the devices in the temperature range of 4.2K to 475K up to 50MHz with minimal vibration and high precision. The integrated fiber optic arm with light source and photodetector enables the characterization of electrical and opto-electrical parameters of device under test in dark and illuminated conditions.

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Simulation Facility


  • Server Sun Fire 2250 and Synopsys Software

The advanced simulation facility consists of Sun server with Silvaco software bundle including TCAD OMNI process and device simulator. The system is configured to perform advanced semiconductor process, device, circuit simulations, and also optoelectronic device simulations. The knowledge is used to design and optimize novel nanoelectronic devices, processes, and materials parameters to achieve the desired device performance.

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Fabrication Facilities


  • Sputtering Deposition System

Sputter

Sputter

Deposition tool used to deposit thin films, including metals, semiconductors, and dielectrics.



  • Mask Aligner System

  • Rapid Thermal Anneal
Aligner
Mask aligner is used for the patterning of photoresist, which includes both alignment and exposure.

RTAThe rapid thermal anneal is used to anneal the sample to high temperature with fast ramp-up and ramp-down time. In our lab, we use it for mostly CMOS process compatible applications.



  • Reactive Ion Etcher

  • Fume Hood

RIE
The reactive ion etcher (RIE) is used for CMOS compatible patterning of thin films in our lab.


Fume HoodThe multi-purpose fume hood provides a safe environment for chemical uses and wet processing.

  • Spin Coater (Spinner)
Spinner

Spinner

The spin coater is used to deposit thin layers of solution onto a substrate, including photoresist as well as some organic materials.



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Access to Other Research Facilities

Micro/Nano-Fabrication Facility and Process Metrology

Lurie Nanofabrication Facility, University of Michigan

Midwest MicroDevices LLC, Toledo, Ohio

Electron Microscopy and Materials Characterization Facility

Our group uses state of art Electron Microscopy and Materials Characterization Center facility at the University of Toledo to perform electron microscopy and materials characterization of samples. The facility includes Scanning Transmission Electron Microscope (STEM), Scanning Electron Microscope (SEM), Dual beam Environmental Scanning Electron Microscope and Focused Ion Beam (ESEM/FIB), High Resolution Transmission Electron Microscope (HRTEM), FTIR Spectrometer, Atomic Force Microscope (AFM), Raman Spectrometer, X-Ray Diffraction (XRD), and Surface Plasmon Resonance Spectrometer (SPR).

Photovoltaic Innovation and Commercialization (PVIC) Center

Our group closely works with the researchers at PVIC and has access to state of art photovoltaic device fabrication and characterization facilities at PVIC located in the University of Toledo.

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